Background Statement for SEMI Draft Document 5658A
New Standard: GUIDE FOR PENTAkis(dimethylamino)Tantalum (PDMAT)
Notice: This background statement is not part of the balloted item. It is provided solely to assist the recipient in reaching an informed decision based on the rationale of the activity that preceded the creation of this Document.
Notice: Recipients of this Document are invited to submit, with their comments, notification of any relevant patented technology or copyrighted items of which they are aware and to provide supporting documentation. In this context, “patented technology” is defined as technology for which a patent has issued or has been applied for. In the latter case, only publicly available information on the contents of the patent application is to be provided.
Introduction
As the semi-conductor industry continues in its efforts to follow Moore’s Law many new materials have been introduced and continue to be introduced into electronic devices. The introduction of new materials being used covers all areas of the integrated circuit, including, but not limited to, high-k dielectric layers, barrier layers, metal interconnects, electrical contacts and low-k dielectric layers. Many of these new materials are deposited from liquid or solid chemicals by means of chemical vapor deposition or increasingly by atomic layer deposition. Therefore, there are now chemicals currently being used or could potentially be used in the future for which there are no SEMI guides or standards.
The Precursor Specification Task Force held its first meeting at SEMICON Europa in 2004 to identify new chemicals currently being used and to draft guides for these chemicals.
Steps taken
With input from ITRS representatives The Precursor Specification Task Force initially examined which chemicals are currently being used or could potentially be used in the future for which there are no SEMI guides. The task force also examined the properties of these chemicals that are important for the deposition process and whether these could be included in a guideline. The Precursor Specification Task Force then selected a couple of chemicals to focus on initially with the aim of producing guides. PDMAT has been adopted as a precursor for TaN deposition, both as an interconnect barrier material and as a Work Function metal for High K Metal Gate transistors. An initial draft of the guide was produced based on task force discussions; this was then revised following comments from chemical manufactures, tool manufactures and end users.
The document as balloted was rejected on the basis that it did not represent accurately the current needs of the industry. This second ballot does include the changes suggested by the reject and approved during the last committee meeting.
Ballot Adjudication Information
1
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Phone:408.943.6900, Fax: 408.943.7943
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Task Force Review / Committee AdjudicationGroup: / Solvents in Advanced Processes / Joint EU Gas & Liquid Chemicals TCChapter
Date: / October 6, 2015 / October 6, 2015
Time & Timezone: / 10am – 12 pm, CET / 2pm-5pm, CET
Location: / Messe Dresden / Messe Dresden
City, Country: / Dresden, Germany / Dresden, Germany
Leader(s): / Jean-Marie Collard (Solvay),
/ Jean-Marie Collard (Solvay),
Standards Staff: / Andrea Busch, / Andrea Busch,
This meeting’s details are subject to change, and additional review sessions may be scheduled if necessary. Contact the task force leaders or Standards staff for confirmation.
Telephone and web information will be distributed to interested parties as the meeting date approaches. If you will not be able to attend these meetings in person, but would like to participate by telephone/web, please contact Standards staff.
Check on calendar of event for the latest meeting schedule.
SEMI Draft Document 5658A
New Standard: GUIDE FOR PENTAkis(dimethylamino) Tantalum (PDMAT)
1 Purpose
1.1 The purpose of this document is to provide a guide for PDMAT for which a need has been identified.
2 Scope
2.1 The scope of this document covers a grade ofPDMAT, which is used in the semiconductor industry for the deposition of Tantalum Nitride based layers by atomic layer deposition.
NOTICE:SEMI Standards and Safety Guidelines do not purport to address all safety issues associated with their use. It is the responsibility of the users of the Documents to establish appropriate safety and health practices, and determine the applicability of regulatory or other limitations prior to use.
3 Limitations
3.1 None
4 Referenced Standards and Documents
4.1 None
5 Terminology
5.1 Acronyms
5.1.1 PDMAT – Pentakis Dimethylamino Tantalum (or Pentakis Dimethylamido Tantalum)
6 Properties
Molecular formula / Ta[N(CH3)2]5
Molecular weight / 401.33 g/mol
CAS number / 19824-59-0
Boiling point / 80°C at 0.05mmHg
Vapor pressure
(P=mm Hg, T=K) / log10P =
11.9696-4346.8/T
Melting point / >100°C (dec)
Solubility in water / Reacts
Appearance / Orange crystals
7 Suggested Values
7.1 The suggested values for PDMAT for Tier A are listed in Table 2.
8 Grade 1 Procedures
8.1 This section does not apply to this chemical.
9 Grade 2 Procedures
9.1 This section does not apply to this chemical.
10 Grade 3 Procedures
10.1 This section does not apply to this chemical.
11 Grade 4 Procedures
11.1 This section does not apply to this chemical.
12 Tier A Procedures
12.1 Standardized test methods are being developed for all parameters at the purity level indicated. Until standardized test methods are published, test methodology should be determined by user and producer.
13 Tier B Procedures
13.1 This section does not apply to this chemical.
14 Tier C Procedures
14.1 This section does not apply to this chemical.
15 Tier D Procedures
15.1 This section does not apply to this chemical.
Table 2Suggested Values for PDMAT
Previous SEMI Reference # / --Tier A
(Guide)
Assay (1H NMR) / ≥99%
Hydrocarbons (1H NMR) / ≤1%
Chloride (Cl) / 5ppm
Aluminium (Al) / 5000ppb
Antimony (Sb) / 500 ppb
Arsenic (As) / 300ppb
Barium (Ba) / 500 ppb
Boron (B) / --
Cadmium (Cd) / 500 ppb
Calcium (Ca) / 3000ppb
Chromium (Cr) / 4000ppb
Copper (Cu) / 3000ppb
Iron (Fe) / 5000 ppb
Lead (Pb) / 2000 ppb
Lithium (Li) / 2000 ppb
Magnesium (Mg) / 2000 ppb
Manganese (Mn) / 2000 ppb
Nickel (Ni) / 3000 ppb
Potassium (K) / 5000ppb
Sodium (Na) / 4000ppb
Tin (Sn) / 500 ppb
Titanium (Ti) / --
Vanadium (V) / --
Zinc (Zn) / 4000 ppb
NOTICE:SEMI makes no warranties or representations as to the suitability of the Standards and Safety Guidelines set forth herein for any particular application. The determination of the suitability of the Standard or Safety Guideline is solely the responsibility of the user. Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant literature, respecting any materials or equipment mentioned herein. Standards and Safety Guidelines are subject to change without notice.
By publication of this Standard or Safety Guideline, SEMI takes no position respecting the validity of any patent rights or copyrights asserted in connection with any items mentioned in this Standard or Safety Guideline. Users of this Standard or Safety Guideline are expressly advised that determination of any such patent rights or copyrights and the risk of infringement of such rights are entirely their own responsibility.
This is a Draft Document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted Standard or Safety Guideline. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.
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